The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2007
Filed:
May. 25, 2006
Yuji Harada, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Kawagoe, JP;
Michitaka Ootani, Kawagoe, JP;
Yuji Harada, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Kazuhiko Maeda, Tokyo, JP;
Haruhiko Komoriya, Kawagoe, JP;
Michitaka Ootani, Kawagoe, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Central Glass Co., Ltd., Ube-shi, JP;
Abstract
Ester compounds having formula (1) wherein Ris fluorine or C-Cfluoroalkyl, Ris C-Calkylene or fluoroalkylene, and Ris an acid labile group are novel. They can be polymerized into polymers which are used to formulate resist compositions, which are processed by the lithography involving ArF exposure, offering many advantages including improved resolution and transparency, minimal line edge roughness, improved etch resistance, and especially minimal surface roughness after etching.