The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2007
Filed:
Jun. 25, 2004
Wilhelmus Josephus Box, Eksel, BE;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Thijs Harink, Eindhoven, NL;
Wilhelmus Josephus Box, Eksel, BE;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Paulus Martinus Maria Liebregts, Veldhoven, NL;
Thijs Harink, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed. The apparatus includes a substrate support for supporting at least one substrate, a radiation system for providing at least one beam of radiation, and a vacuum chamber. The vacuum chamber includes a patterning device and/or a projection system. The patterning device is arranged for patterning the beam of radiation according to a desired pattern, and the projection system is arranged for projecting the patterned beam of radiation onto a target portion of the substrate. The apparatus also includes at least one thermal shield for thermally conditioning at least part of the apparatus. The thermal shield includes particle transmission channels for transmitting particles through the shield, from a first side of the shield to a second side of the shield.