The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2007
Filed:
Jun. 20, 2006
Shifang LI, Pleasanton, CA (US);
Junwei Bao, Palo Alto, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Xinhui Niu, San Jose, CA (US);
Shifang Li, Pleasanton, CA (US);
Junwei Bao, Palo Alto, CA (US);
Nickhil Jakatdar, Los Altos, CA (US);
Xinhui Niu, San Jose, CA (US);
Timbre Technologies, Inc., Santa Clara, CA (US);
Abstract
An optical metrology system includes a photometric device with a source configured to generate and direct light onto a structure, and a detector configured to detect light diffracted from the structure and to convert the detected light into a measured diffraction signal. A processing module of the optical metrology system is configured to receive the measured diffraction signal from the detector to analyze the structure. The optical metrology system also includes a generic interface disposed between the photometric device and the processing module. The generic interface is configured to provide the measured diffraction signal to the processing module using a standard set of signal parameters. The standard set of signal parameters includes a reflectance parameter chat characterizes the change in intensity of light when reflected on the structure and a polarization parameter that characterizes the change in polarization states of light when reflected on the structure.