The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7271876 B1

PDF
Full Text
Expired
Date of Patent:
Sep. 18, 2007

Filed:

Aug. 17, 2004
Applicants:

Wilhelm Ulrich, Aalen, DE;

Gerhard Fuerter, Ellwangen, DE;

Michael Gerhard, Aalen, DE;

Inventors:

Wilhelm Ulrich, Aalen, DE;

Gerhard Fuerter, Ellwangen, DE;

Michael Gerhard, Aalen, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract

A projection objective for microlithography for imaging a pattern arranged in the object plane of the projection objective into the image plane of the projection objective has at least one polarization splitter device that is operated only once in transmission or reflection. By using this device, polarization-dependent differences in the intensity and response of the light passing through the objective, which lead to a worsening of the imaging quality of the projection objective, can largely be avoided.


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