The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2007

Filed:

Aug. 13, 2004
Applicant:

Pary Baluswamy, Boise, ID (US);

Inventor:

Pary Baluswamy, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

An in-situ spectrograph having a spectrometer module positioned at a reticle plane or at a wafer plane of a photolithography projection system is disclosed. The spectrometer module disperses light projected from an illumination source, and the produced spectrum may be recorded. The spectrum may be recorded using a photodetector or a layer of photoresist. The recorded spectrums produced by illumination sources of a plurality of steppers may be compared, thus providing a comparison of the wavelength characteristics, particularly the wavelength spread and intensity of the light of the illumination sources. A plurality of spectrometer modules may be used to provide a comparison of the central wavelength of light produced by the illumination sources. The absolute wavelength of light produced by an illumination source may be determined using a spectrometer module having a spectrometer grating.


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