The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2007
Filed:
Apr. 29, 2005
Masami Akimoto, Koshi-Machi, JP;
Shinichi Hayashi, Koshi-Machi, JP;
Yasushi Hayashida, Koshi-Machi, JP;
Nobuaki Matsuoka, Koshi-Machi, JP;
Yoshio Kimura, Koshi-Machi, JP;
Issei Ueda, Koshi-Machi, JP;
Hikaru Ito, Minato-Ku, JP;
Masami Akimoto, Koshi-Machi, JP;
Shinichi Hayashi, Koshi-Machi, JP;
Yasushi Hayashida, Koshi-Machi, JP;
Nobuaki Matsuoka, Koshi-Machi, JP;
Yoshio Kimura, Koshi-Machi, JP;
Issei Ueda, Koshi-Machi, JP;
Hikaru Ito, Minato-Ku, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either of a case where antireflection films are formed and where any antireflection film is not formed. Film forming unit blocks: TCT layer B, a COT layer Band a BCT layer B, and developing unit blocks: DEV layers Band B, are stacked up in layers in a processing block S. The TCT layer B, the COT layer Band the BCT layer Bare used selectively where antireflection films are formed and any antireflection film is not formed. The coating and developing system is controlled by a carrying program and software.