The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Mar. 11, 2004
Seon-mee Cho, Beaverton, OR (US);
Easwar Srinivasan, Beaverton, OR (US);
Brian G. LU, Fremont, CA (US);
David Mordo, Cupertino, CA (US);
Seon-Mee Cho, Beaverton, OR (US);
Easwar Srinivasan, Beaverton, OR (US);
Brian G. Lu, Fremont, CA (US);
David Mordo, Cupertino, CA (US);
Novellus Systems, Inc., San Jose, CA (US);
Abstract
Methods and apparatus for preparing a porous low-k dielectric material on a substrate are provided. The methods optionally involve the use of ultraviolet radiation to react with and remove porogen from a porogen containing precursor film leaving a porous dielectric matrix and further exposing the dielectric matrix to ultraviolet radiation to increase the mechanical strength of the dielectric matrix. Some methods involve activating a gas to create reactive gas species that can clean a reaction chamber. One disclosed apparatus includes an array of multiple ultraviolet sources that can be controlled such that different wavelengths of light can be used to irradiate a sample at a time.