The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 04, 2007
Filed:
Apr. 24, 2006
Alexander Paterson, San Jose, CA (US);
Valentin N. Todorow, Palo Alto, CA (US);
Theodoros Panagopoulos, San Jose, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, Saratoga, CA (US);
Edward P. Hammond, Iv, Hillsborough, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Matyushkin, San Jose, CA (US);
Alexander Paterson, San Jose, CA (US);
Valentin N. Todorow, Palo Alto, CA (US);
Theodoros Panagopoulos, San Jose, CA (US);
Brian K. Hatcher, San Jose, CA (US);
Dan Katz, Saratoga, CA (US);
Edward P. Hammond, IV, Hillsborough, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Matyushkin, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A plasma reactor includes a toroidal plasma source having an RF power applicator, and RF generator being coupled to the RF power applicator. The reactor further includes a capacitively coupled plasma source power applicator or electrode at the ceiling or the workpiece support, a VHF power generator being coupled to the capacitively coupled source power applicator, a plasma bias power applicator or electrode in the workpiece support and an RF bias power generator coupled to the plasma bias power applicator. A controller adjusts the relative amounts of power simultaneously coupled to plasma in the chamber and conduit by the toroidal plasma source and by the capacitively coupled plasma source power applicator.