The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2007
Filed:
Dec. 01, 2004
M'hamed Akhssay, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Franciscus Antonius Chrysogonus Marie Commissaris, Waalre, NL;
Simon DE Groot, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Wim Tjibbo Tel, Helmond, NL;
Alexander Hendrikus Martinus Van Der Hoff, Valkenswaard, NL;
Arnout Van DE Stadt, Eindhoven, NL;
M'hamed Akhssay, Helmond, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Franciscus Antonius Chrysogonus Marie Commissaris, Waalre, NL;
Simon De Groot, Eindhoven, NL;
Andre Bernardus Jeunink, Bergeyk, NL;
Wim Tjibbo Tel, Helmond, NL;
Alexander Hendrikus Martinus Van Der Hoff, Valkenswaard, NL;
Arnout Van De Stadt, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus includes a measurement system for measuring changes in projection system aberrations with time, and a predictive control system for predicting variation of projection system aberrations with time on the basis of model parameters and for generating a control signal for compensating a time-varying property of the apparatus, such as the OVL values (X-Y adjustment) and the FOC values (Z adjustment) of a lens of the projection system for example. An inline model identification system is provided for estimating model parameter errors on the basis of projection system aberration values provided by the predictive control system and measured projection system aberration values provided by the measurement system, and an updating system utilizes the model parameter errors for updating the model parameters of the predictive control system in order to maintain the time-varying property within acceptable performance criteria.