The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2007
Filed:
Mar. 28, 2005
Applicants:
Takayuki Hosono, Kawasaki, JP;
Koki Tamura, Kawasaki, JP;
Daisuke Kawana, Kawasaki, JP;
Tomotaka Yamada, Kawasaki, JP;
Inventors:
Takayuki Hosono, Kawasaki, JP;
Koki Tamura, Kawasaki, JP;
Daisuke Kawana, Kawasaki, JP;
Tomotaka Yamada, Kawasaki, JP;
Assignee:
Tokyo Ohka Kogyo Co., Ltd., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract
A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a silicone resin and the acid generator component (B) contains an onium salt-based acid generator (B1) containing a perfluoroalkyl sulfonate ion having 3 or 4 carbon atoms as an anion.