The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Apr. 21, 2004
Zhendong Liu, Newark, DE (US);
John Quanci, Haddonfield, NJ (US);
Robert E. Schmidt, Bear, DE (US);
Terence M. Thomas, Newark, DE (US);
Zhendong Liu, Newark, DE (US);
John Quanci, Haddonfield, NJ (US);
Robert E. Schmidt, Bear, DE (US);
Terence M. Thomas, Newark, DE (US);
Rohm and Haas Electronic Materials CMP Holding, Inc., Newark, DE (US);
Abstract
The polishing solution is useful for preferentially removing barrier materials in the presence of nonferrous interconnect metals with limited erosion of dielectrics. The polishing solution comprises 0 to 20 weight percent oxidizer, at least 0.001 weight percent inhibitor for reducing removal rate of the nonferrous interconnect metals, 10 ppb to 4 weight percent complexing agent, 0 to 50 weight percent abrasive and balance water; and the solution having a pH of less than 7.