The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Jan. 21, 2005
Norihiko Ikeda, Chuo-ku, JP;
Kazuo Nishimoto, Chuo-ku, JP;
Masayuki Hattori, Chuo-ku, JP;
Nobuo Kawahashi, Chuo-ku, JP;
Norihiko Ikeda, Chuo-ku, JP;
Kazuo Nishimoto, Chuo-ku, JP;
Masayuki Hattori, Chuo-ku, JP;
Nobuo Kawahashi, Chuo-ku, JP;
JSR Corporation, Tokyo, JP;
Abstract
A chemical mechanical polishing aqueous dispersion comprises abrasives (A) containing ceria, an anionic water-soluble polymer (B) and a cationic surfactant (C), wherein the amount of the anionic water-soluble polymer (B) is in the range of 60 to 600 parts by mass based on 100 parts by mass of the abrasives (A) containing ceria, and the amount of the cationic surfactant (C) is in the range of 0.1 to 100 ppm based on the whole amount of the chemical mechanical polishing aqueous dispersion.