The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2007
Filed:
Dec. 31, 2003
Vadim Yevgenyevich Banine, Helmond, NL;
Levinus Pieter Bakker, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Johannes Hubertus Josephina Moors, Helmond, NL;
Givi Georgievitch Zukavishvili, Moscow, RU;
Abraham Veefkind, Noordwijk, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Levinus Pieter Bakker, Helmond, NL;
Vladimir Vitalevitch Ivanov, Moscow, RU;
Johannes Hubertus Josephina Moors, Helmond, NL;
Givi Georgievitch Zukavishvili, Moscow, RU;
Abraham Veefkind, Noordwijk, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a debris-mitigation system that mitigates debris particles which are formed during use of at least a part of the lithographic apparatus. The debris-mitigation system is arranged to apply a magnetic field so that at least charged debris particles are mitigated.