The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2007
Filed:
Dec. 15, 2003
Erwin Van Zwet, Delfgauw, NL;
Jan Van Elp, Delft, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Hendrik Antony Johannes Neerhof, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Adrianus Mathijs Maria DE Groof, Geldrop, NL;
Leo Wilhelmus Maria Kuipers, Eindhoven, NL;
Peter Theodorus Maria Giesen, The Hague, NL;
Marco Le Kluse, Maassluis, NL;
Erwin Van Zwet, Delfgauw, NL;
Jan Van Elp, Delft, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Hendrik Antony Johannes Neerhof, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Adrianus Mathijs Maria De Groof, Geldrop, NL;
Leo Wilhelmus Maria Kuipers, Eindhoven, NL;
Peter Theodorus Maria Giesen, The Hague, NL;
Marco Le Kluse, Maassluis, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The lithographic apparatus includes an illumination system for providing a beam of radiation on a flat article to be placed in a beam path of the beam of radiation, and an article handler for handling the article during placement or removal of the article. The article handler includes an electrode and a dielectric layer in order to form an electrostatic clamp for electrostatically clamping the article.