The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2007
Filed:
Jun. 13, 2005
Willem Jurrianus Venema, Eindhoven, NL;
Anastasius Jacobus Anicetus Bruinsma, Delft, NL;
Joeri Lof, Eindhoven, NL;
Eduardus Johannes Gerardus Boon, Weert, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Anastasius Jacobus Anicetus Bruinsma, Delft, NL;
Joeri Lof, Eindhoven, NL;
Eduardus Johannes Gerardus Boon, Weert, NL;
ASML Netherlands B.V., , NL;
Abstract
A lithographic apparatus comprises an illumination system, an array of individually controllable elements, a projection system, a substrate table, and a sensor system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The projection system projects the patterned beam onto a target plane, the patterned beam comprising an array of radiation spots. The substrate table supports a substrate, such that a target surface of the substrate is substantially coincident with the target plane. The sensor system comprises an array of detector elements arranged to receive at least one of the spots. The sensor system measures an energy of the or each received spot and provides an output signal indicative of the energy of the or each received spot.