The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2007
Filed:
May. 20, 2005
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Arnoud Cornelis Wassink, Veldhoven, NL;
Derk Jan Wildred Klunder, Geldrop, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Arnoud Cornelis Wassink, Veldhoven, NL;
Derk Jan Wildred Klunder, Geldrop, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation system for providing a projection beam of radiation in a lithographic apparatus is disclosed. The radiation system includes an EUV source for providing EUV radiation, and a contamination barrier that includes a plurality of foil plates for trapping contaminant material coming from the EUV source. The foil plates are arranged in an optically closed arrangement so that at least one of the foil plates reflects EUV radiation passing the contamination barrier at least one time.