The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2007
Filed:
Aug. 27, 2004
Daisuke Hayashi, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Shinji Himori, Nirasaki, JP;
Atsushi Matsuura, Nirasaki, JP;
Ryo Nonaka, Nirasaki, JP;
Daisuke Hayashi, Nirasaki, JP;
Kazuya Nagaseki, Nirasaki, JP;
Shinji Himori, Nirasaki, JP;
Atsushi Matsuura, Nirasaki, JP;
Ryo Nonaka, Nirasaki, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
Disclosed herein is a plasma processing apparatus that introduces a process gas into an airtight processing container, that applies a radio frequency power to generate plasma, and that conducts a plasma process to an object to be processed arranged in the processing container. The plasma processing apparatus includes: an electrode unit arranged in the processing container, the electrode unit having an electrode for applying the radio frequency power, and a space portion arranged in the electrode unit, the space portion insulating the electrode and the processing container from each other. The space portion communicates with atmospheric air outside the processing container.