The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2007
Filed:
Nov. 25, 2002
Shigeru Kasai, Nirasaki-shi, JP;
Nobuhiko Yamamoto, Amagasaki-shi, JP;
Hikaru Adachi, Amagasaki-shi, JP;
Yuki Osada, Nirasaki-shi, JP;
Shigeru Kasai, Nirasaki-shi, JP;
Nobuhiko Yamamoto, Amagasaki-shi, JP;
Hikaru Adachi, Amagasaki-shi, JP;
Yuki Osada, Nirasaki-shi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma processing apparatus includes an evacuatable processing vessel; a workpiece mount base for mounting thereon an object to be processed; a microwave transmitting plate provided in an opening of a ceiling of the processing vessel; a planar antenna member for supplying a microwave into the processing vessel via the microwave transmitting plate; a shield lid grounded to cover a top of the planar antenna member; a waveguide for guiding the microwave to the planar antenna member; a member elevating mechanism for relatively varying a vertical distance between the planar antenna member and the shield lid; a tuning rod insertable into the waveguide; a tuning rod driving mechanism for moving the tuning rod to adjust an insert amount thereof; and a matching control section for controlling an elevation amount of the planar antenna member and the insert amount of the tuning rod to obtain a matching adjustment.