The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2007
Filed:
Oct. 20, 2004
Gerhard Stengl, Wernberg, AT;
Elmar Platzgummer, Vienna, AT;
Hans Loschner, Vienna, AT;
IMS Nanofabrication GmbH, Vienna, AT;
Abstract
A charged-particle multi-beam exposure apparatus () for exposure of a target () uses a plurality of beams of electrically charged particles, which propagate along parallel beam paths towards the target (). For each particle beam an illumination system (), a pattern definition means () and a projection optics system () are provided. The illuminating system () and/or the projection optics system () comprise particle-optical lenses having lens elements (L, L, L, L, L) common to more than one particle beam. The pattern definition means () defines a multitude of beamlets in the respective particle beam, forming its shape into a desired pattern which is projected onto the target (), by allowing it to pass only through a plurality of apertures defining the shape of beamlets permeating said apertures, and further comprises a blanking means to switch off the passage of selected beamlets from the respective paths of the beamlets.