The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2007
Filed:
Sep. 30, 2004
Thomas A. Bauer, Poughkeepsie, NY (US);
Steven H. Boettcher, Fishkill, NY (US);
Anthony G. Domenicucci, New Paltz, NY (US);
John G. Gaudiello, Poughkeepsie, NY (US);
Leon J. Kimball, Montgomery, NY (US);
Jeffrey S. Mcmurray, Wappingers Falls, NY (US);
Yun-yu Wang, Poughquag, NY (US);
Thomas A. Bauer, Poughkeepsie, NY (US);
Steven H. Boettcher, Fishkill, NY (US);
Anthony G. Domenicucci, New Paltz, NY (US);
John G. Gaudiello, Poughkeepsie, NY (US);
Leon J. Kimball, Montgomery, NY (US);
Jeffrey S. McMurray, Wappingers Falls, NY (US);
Yun-Yu Wang, Poughquag, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for preparing a transmission electron microscopy (TEM) sample for electron holography includes forming a sacrificial material over an area of interest on the sample, and polishing the sample to a desired thickness, wherein the area of interest is protected from rounding during the polishing. The sacrificial material is removed from the sample following the polishing.