The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
Mar. 25, 2005
Applicants:
Pieter Willem Herman DE Jager, Rotterdam, NL;
Theodorus Leonardus Van Den Akker, Valkenswaard, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Wouter Frans Willem Mulckhuyse, Bussum, NL;
Lambertus Gerardus Maria Kessels, Aalst-Waalre, NL;
Inventors:
Pieter Willem Herman De Jager, Rotterdam, NL;
Theodorus Leonardus Van Den Akker, Valkenswaard, NL;
Willem Jurrianus Venema, Eindhoven, NL;
Wouter Frans Willem Mulckhuyse, Bussum, NL;
Lambertus Gerardus Maria Kessels, Aalst-Waalre, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.