The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2007

Filed:

Oct. 21, 2004
Applicant:

David Y Wang, Fremont, CA (US);

Inventor:

David Y Wang, Fremont, CA (US);

Assignee:

Therma-Wave, Inc., Fremont, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F21V 9/06 (2006.01); G02B 5/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

An infrared filter for an optical metrology tool includes a substrate having film stacks on opposing surfaces thereof. A first film stack can be used to reflect ultra-violet radiation and transmit radiation at non-ultraviolet wavelengths. The second film stack can be used to reflect visible to near-infrared radiation and transmit infrared radiation. The combination of film stacks can therefore extract infrared radiation from a broadband beam, with the remaining ultra-violet radiation and visible to near-infrared radiation forming the product of the filter. The filter can be used as part of the illumination or collection side optics in a broadband optical metrology tool.


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