The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
May. 25, 2005
David Schaefer, Vancouver, WA (US);
Robert Charatan, Portland, OR (US);
David Schaefer, Vancouver, WA (US);
Robert Charatan, Portland, OR (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A method for etching a trench is provided. The method initiates with providing a substrate having a patterned feature. The method includes alternating between deposition of a protective layer onto inner surfaces of the patterned feature and etching the trench into the substrate. The alternating may be achieved through a gas modulation technique and in one embodiment, the deposition and the etching are performed in the same chamber, i.e., the substrate does not move to a different chamber between the etch and deposition processes. The alternating is continued until the trench is completed and then the trench is filled. A semiconductor processing system is also provided.