The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Feb. 05, 2004
Kazuhiro Takeshita, Kumamoto, JP;
Shinji Nagashima, Kikuchi-gun, JP;
Makoto Muramatsu, Kamimashiki-gun, JP;
Yoji Mizutani, Kawasaki, JP;
Kazutoshi Yano, Kikuchi-gun, JP;
Kyoshige Katayama, Kumamoto, JP;
Kazuhiro Takeshita, Kumamoto, JP;
Shinji Nagashima, Kikuchi-gun, JP;
Makoto Muramatsu, Kamimashiki-gun, JP;
Yoji Mizutani, Kawasaki, JP;
Kazutoshi Yano, Kikuchi-gun, JP;
Kyoshige Katayama, Kumamoto, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamberis suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.