The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Oct. 16, 2001
Keisuke Kawamura, Futtsu, JP;
Tsutomu Sasaki, Futtsu, JP;
Atsuki Matsumura, Futtsu, JP;
Atsushi Ikari, Futtsu, JP;
Isao Hamaguchi, Futtsu, JP;
Yoshiharu Inoue, Futtsu, JP;
Koki Tanaka, Futtsu, JP;
Shunichi Hayashi, Futtsu, JP;
Keisuke Kawamura, Futtsu, JP;
Tsutomu Sasaki, Futtsu, JP;
Atsuki Matsumura, Futtsu, JP;
Atsushi Ikari, Futtsu, JP;
Isao Hamaguchi, Futtsu, JP;
Yoshiharu Inoue, Futtsu, JP;
Koki Tanaka, Futtsu, JP;
Shunichi Hayashi, Futtsu, JP;
Nippon Steel Corporation, Tokyo, JP;
Abstract
The present invention provides a wafer holder, a wafer support member, a wafer boat and a heat treatment furnace, which are capable of sufficiently suppressing slip dislocations, without lowering productivity and at low cost, in the high temperature heat treatment of silicon wafers, and said wafer holder is characterized in that: the wafer holder is composed of a wafer support plate and three or more wafer support members mounted on said wafer support plate, each of the wafer support members having a wafer support portion or more; at least one of said wafer support members is a tilting wafer support member which has a plurality of upward-convex wafer support portions on the upper surface and is tiltable with respect to said wafer support plate; and the wafer is supported by at least four wafer support portions.