The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Jun. 01, 2004
William A. Mcgahan, Spicewood, TX (US);
William A. McGahan, Spicewood, TX (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
A model of a sample with one or more films that overlie a complicated structure can be produced using a first portion that models the physical characteristics of the film(s) and a second portion that does not attempt to model the physical characteristics of the underlying structure, but instead models the affect of the underlying structure on incident light. By way of example, the second portion of the model may use a one-dimensional periodic pattern to model a complicated two-dimensional periodic pattern. A characteristic, such as thickness, of the film(s) may be measured using the model. The results may be verified by the linear relationship of ratios between a plurality of measured locations on the sample and associated locations on the sample that do not have the underlying structures.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile