The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Oct. 27, 2005
Toshihiko Kitoku, Nirasaki, JP;
Shinji Niwa, Nirasaki, JP;
Toshiki Hosaka, Kofu, JP;
Takashi Kitazawa, Nirasaki, JP;
Atsuo Sanda, Oita, JP;
Yoshitaka Sato, Yokohama, JP;
Toshihiko Kitoku, Nirasaki, JP;
Shinji Niwa, Nirasaki, JP;
Toshiki Hosaka, Kofu, JP;
Takashi Kitazawa, Nirasaki, JP;
Atsuo Sanda, Oita, JP;
Yoshitaka Sato, Yokohama, JP;
Tokyo Electron Limited, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
An etching processing apparatushas a transfer chamber, a plurality of processing chambersand, and a plurality of cassette chambersand. Inside the transfer chamber, a transfer mechanismis provided. A control devicepauses the operation of the vacuum pumpafter closing an opening/closing valveof a vacuum evacuating mechanism, which vacuum evacuates the transfer chamberin which the transfer mechanismis provided, when the operation of the transfer mechanismis paused for a predetermined time or longer. Accordingly, conservation of energy becomes possible without causing decrease of productivity.