The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Jun. 14, 2004
Meng Fei Koh, Singapore, SG;
Choon Siong Poh, Singapore, SG;
Inn Swee Goh, Singapore, SG;
Theng Wei Leong, Singapore, SG;
Teck Leong Neo, Singapore, SG;
Bing Wang, Singapore, SG;
Meng Fei Koh, Singapore, SG;
Choon Siong Poh, Singapore, SG;
Inn Swee Goh, Singapore, SG;
Theng Wei Leong, Singapore, SG;
Teck Leong Neo, Singapore, SG;
Bing Wang, Singapore, SG;
Systems on Silicon Manufacturing Co. Pte. Ltd., Singapore, SG;
Abstract
The present invention relates generally to the field of chemical/mechanical polishing of substrates. In particular the invention relates to methods of producing improved membranes for use in chemical/mechanical polishing systems. The present invention provides a method of improving the properties of a flexible membrane for use in chemical/mechanical polishing, the method including subjecting the membrane to elevated temperatures.