The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Sep. 20, 2001
John Fielden, Los Altos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Kyle A. Brown, Irvine, CA (US);
Gary Bultman, Los Altos, CA (US);
Mehrdad Nikoonahad, Menlo Park, CA (US);
Dan Wack, Los Altos, CA (US);
John Fielden, Los Altos, CA (US);
Ady Levy, Sunnyvale, CA (US);
Kyle A. Brown, Irvine, CA (US);
Gary Bultman, Los Altos, CA (US);
Mehrdad Nikoonahad, Menlo Park, CA (US);
Dan Wack, Los Altos, CA (US);
KLA-Tencor Technologies Corp., Milpitas, CA (US);
Abstract
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thin film characteristic and an electrical property of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.