The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Oct. 26, 2004
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frederik Eduard DE Jong, Eindhoven, NL;
Koen Goorman, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
Edwin Van Gompel, Valkenswaard, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frederik Eduard De Jong, Eindhoven, NL;
Koen Goorman, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
Edwin Van Gompel, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a substrate support that is constructed to support a substrate, and a projection system that is configured to project a patterned radiation beam onto a target portion of the substrate. The substrate support is arranged to move the substrate along a predetermined trajectory of subsequently targeted target portions of the substrate. The substrate support includes a duct configuration for providing thermal stabilization to the substrate. The duct configuration is arranged to duct thermally stabilizing media in the support, and to substantially duct the media away from a part of the substrate support that supports the target portion via parts of the substrate support that support previously targeted portions of the substrate, so as to keep subsequently targeted target portions thermally stable.