The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Nov. 18, 2003
Yuichiro Sasaki, Tokyo, JP;
Bunji Mizuno, Nara, JP;
Ichiro Nakayama, Osaka, JP;
Hisataka Kanada, Osaka, JP;
Tomohiro Okumura, Osaka, JP;
Yuichiro Sasaki, Tokyo, JP;
Bunji Mizuno, Nara, JP;
Ichiro Nakayama, Osaka, JP;
Hisataka Kanada, Osaka, JP;
Tomohiro Okumura, Osaka, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
A method of plasma doping in which dilution of BHis maximized for enhanced safety and stable plasma generation and sustention can be carried out without lowering of doping efficiency and in which the amount of dopant injected can be easily controlled. In particular, a method of plasma doping characterized in that BHgas is used as a material containing doping impurity while He is used as a substance of high dissociation energy and that the concentration of BHin mixed gas is less than 0.05%.