The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7191033 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 13, 2007

Filed:

Jan. 04, 2005
Applicants:

Makio Higashi, Tokyo, JP;

Akira Miyata, Tokyo, JP;

Inventors:

Makio Higashi, Tokyo, JP;

Akira Miyata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate processing apparatus having a recipe storage section, a transfer control section and a transfer schedule changing section which, when delivery of an n-th substrate from a transfer art to the previous module is delayed by 'm' cycles, changes a transfer schedule so as to move each of n-th and subsequent substrates (including the n-th substrate) in the transfer schedule to a module to which an 'm'-th substrate following the substrate has been allocated, and transferring the changed transfer schedule data to the transfer control section.


Find Patent Forward Citations

Higashi, Makio. (2007). Substrate processing apparatus and substrate processing method (U.S. Patent No. 7191033). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7191033

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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