The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Dec. 04, 2003
Applicants:
Mutsuhiko Yoshioka, Tokyo, JP;
Eiji Hayashi, Tokyo, JP;
Norihiko Ikeda, Tokyo, JP;
Inventors:
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A stopper for chemical mechanical planarization comprising an organosilicon polymer, in particular a polycarbosilane, is provided. The stopper used for polishing wafers with a wiring pattern in the manufacture of semiconductor devices to protect interlayer dielectric films made of a material such as SiO, fluorine dope SiO, or organic or inorganic SOG (Spin-on glass) from damages during the chemical mechanical planarization process.
Yoshioka, Mutsuhiko. (2007). Stopper for chemical mechanical planarization, method for manufacturing same, and chemical mechanical planarization method (U.S. Patent No. 7189651). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7189651
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile