The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2007

Filed:

Apr. 06, 2005
Applicants:

Joost Jeroen Ottens, Veldhoven, NL;

Hendrik Antony Johannes Neerhof, Eindhoven, NL;

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Marco Le Kluse, Maassluis, NL;

Inventors:

Joost Jeroen Ottens, Veldhoven, NL;

Hendrik Antony Johannes Neerhof, Eindhoven, NL;

Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;

Marco Le Kluse, Maassluis, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03B 27/62 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrostatic clamp assembly for a lithographic apparatus is provided. The clamp assembly includes an electrostatic clamp structured to clamp an article against an article support structure during projection of a beam of radiation, and a controller structured to control at least one of the clamp and a backfill gas pressure to release the article from the article support structure by use of the backfill gas pressure.


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