The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Feb. 23, 2005
Kotaro Fujimoto, Kudamatsu, JP;
Takeshi Shimada, Hikari, JP;
Kotaro Fujimoto, Kudamatsu, JP;
Takeshi Shimada, Hikari, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention provides a plasma etching method that can etch a metal film as a material to be etched selectively against an organic film underlying the material. The etching method comprising the steps of introducing an etching gas in an etching chamber wherein a material to be etched is placed, and exciting the etching gas to a plasma state to etch that material to be etched, wherein the material to be etched is a metal filmconsisting of Au, Pt, Ag, Ti, TiN, TiO, Al, an aluminum alloy, or a laminated film of these films laminated on an organic film; and the etching gas is a mixed gas containing at least a gas selected from a group consisting of Cl, BCl, and HBr; and at least a gas selected from a group consisting of CHCl, CHBr, CHCl, CHBr, CHF, and CH.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile