The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Oct. 28, 2004
Robert D. Harned, Redding, CT (US);
Cheng-qun Gui, Best, NL;
Nora-jean Harned, Redding, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A system and method use a pattern generator to pattern illumination that is projected using an adjustable projection system to form one or more devices on a substrate. The adjustable projection system includes at least one active mirror, which is adjusted to compensate for errors found on a surface of the pattern generator, the substrate, and or an optical element in the lithography system. In one example, the adjustable projection system includes two concave and one convex mirrors, while in another system the adjustable projection system also includes one or two fold mirrors. At least one of the mirrors in these two examples is an active mirror, which is used for the compensating. In this arrangement, local focus and/or magnification errors can be substantially reduced or eliminated.