The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2007
Filed:
Mar. 05, 2004
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Emiel Jozef Melanie Eussen, Margraten, NL;
Engelbertus Johannes Jeroen Klijntunte, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Emiel Jozef Melanie Eussen, Margraten, NL;
Engelbertus Johannes Jeroen Klijntunte, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with respect to each other. The at least one portion of the metrology beam enters the device along an incoming optical axis at a first major surface of the first optical wedge, passes through the first and second optical wedges, and exits at a second major surface of the second optical wedge. The first and second optical wedges are arranged to at least one of rotate and translate the at least one portion of the metrology beam relative to the incoming optical axis by changing the relative position of the first and the second optical wedges.