The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2007
Filed:
Jun. 29, 2005
Frits Van Der Meulen, Breda, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Robertus Johannes Van Vliet, Eersel, NL;
Stoyan Nihtianov, Eindhoven, NL;
Petrus Wilhelmus Josephus Maria Kemper, Waalre, NL;
Roland Petrus Hendrikus Hanegraaf, Heeswijk-Dinther, NL;
Frits Van Der Meulen, Breda, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Martijn Houkes, Sittard, NL;
Robertus Johannes Van Vliet, Eersel, NL;
Stoyan Nihtianov, Eindhoven, NL;
Petrus Wilhelmus Josephus Maria Kemper, Waalre, NL;
Roland Petrus Hendrikus Hanegraaf, Heeswijk-Dinther, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a substrate table to hold a substrate; a substrate table position measurement system to measure a position quantity of the substrate table, a projection system to project a patterned radiation beam onto a target portion of the substrate, a fluid supply system to supply an immersion fluid in a space between a downstream lens of the projection system and the substrate, and a fluid supply system position measurement system to measure a position quantity of the fluid supply system. To prevent a collision between the fluid supply system and the substrate table, a damage control system of the lithographic apparatus may include a calculator to calculate a dimensional quantity of a gap between the fluid supply system and the substrate table from the positioned quantity of the substrate table and the position quantity of the fluid supply system. The damage control system may generate a warning signal when the dimensional quantity goes beyond a predetermined safety level.