The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
Dec. 30, 2003
Vadim Yevgenyevich Banine, Helmond, NL;
Johannes Peterus Henricus DE Kuster, Heeze, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Johannes Peterus Henricus De Kuster, Heeze, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The lithographic apparatus includes a radiation source that produces EUV radiation, an illumination system that provides a beam of the EUV radiation produced by the radiation source, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The radiation source includes a debris-mitigation system that mitigates debris particles which are formed during production of EUV radiation. The debris-mitigation system is configured to provide additional particles for interacting with the debris particles.