The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2007
Filed:
Mar. 03, 2003
Daisuke Shiraishi, Kudamatsu, JP;
Akira Kagoshima, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Takeshi Arai, Yokohama, JP;
Hiroyuki Nakano, Yokohama, JP;
Daisuke Shiraishi, Kudamatsu, JP;
Akira Kagoshima, Kudamatsu, JP;
Hideyuki Yamamoto, Kudamatsu, JP;
Takeshi Arai, Yokohama, JP;
Hiroyuki Nakano, Yokohama, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A particle control device and a particle control method are capable of controlling the occurrences of particles in a vacuum reactor. The particle control device is used in a vacuum processing apparatus having a vacuum reactor, a gas delivery unit for supplying processing gases to the vacuum reactor, and a sample table for supporting a sample in the vacuum reactor, wherein the apparatus subjects the sample to vacuum processing. The particle control device detects particles floating inside the vacuum reactor; generates apparatus condition data indicating a condition of the vacuum processing apparatus; and determines a component which is high in a particle occurrence probability based on detected particle data and apparatus condition data, thereby enabling display of the component selected as the particle source.