The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2007

Filed:

Apr. 26, 2004
Applicants:

Robert D. Harned, Redding, CT (US);

Patrick DE Jager, Veldhoven, AN;

Cheng-qun Gui, Best, AN;

Inventors:

Robert D. Harned, Redding, CT (US);

Patrick de Jager, Veldhoven, AN;

Cheng-Qun Gui, Best, AN;

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/70 (2006.01); G03B 27/42 (2006.01); G09G 1/06 (2006.01); G09B 17/00 (2006.01); G02B 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure system for manufacturing flat panel displays (FPDs) includes a reticle stage adapted to support a reticle. A substrate stage is adapted to support a substrate. A reflective optical system is adapted adapted to image the reticle onto the substrate. The reflective optical system includes a primary mirror including a first mirror and a second mirror, and a secondary mirror. The reflective optical system has sufficient degrees of freedom for both alignment and correction of third order aberrations when projecting an image of the reticle onto the substrate by reflections off the first mirror, the secondary mirror, and the second mirror.


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