The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 2006
Filed:
Dec. 13, 2002
L. Richard Carley, Sewickley, PA (US);
Suresh Santhanam, Cranberry Township, PA (US);
Hsu Yu-nu, Pittsburgh, PA (US);
L. Richard Carley, Sewickley, PA (US);
Suresh Santhanam, Cranberry Township, PA (US);
Hsu Yu-Nu, Pittsburgh, PA (US);
IC Mechanics Inc., Pittsburgh, PA (US);
Abstract
This invention comprises a process for fabricating a MEMS microstructure in a sealed cavity wherein the etchant entry holes are created as a by-product of the fabrication process without an additional step to etch holes in the cap layer. The process involves extending the layers of sacrificial material past the horizontal boundaries of the cap layer. The cap layer is supported by pillars formed by a deposition in holes etched through the sacrificial layers, and the etchant entry holes are formed when the excess sacrificial material is etched away, leaving voids between the pillars supporting the cap.