The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Oct. 29, 2004
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Hako Botma, Eindhoven, NL;
Jan Bruining, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
Markus Franciscus Antonius Eurlings, Tilburg, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Hako Botma, Eindhoven, NL;
Jan Bruining, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Judocus Marie Dominicus Stoeldraijer, Bladel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (), such that a projection beam of radiation () can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam () will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element () may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.