The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2006
Filed:
Dec. 04, 2002
Yoshiaki Mori, Nagano ken, JP;
Takuya Miyakawa, Suwa, JP;
Mitsuru Sato, Suwa, JP;
Shintaro Asuke, Suwa, JP;
Kenichi Takagi, Suwa, JP;
Yoshiaki Mori, Nagano ken, JP;
Takuya Miyakawa, Suwa, JP;
Mitsuru Sato, Suwa, JP;
Shintaro Asuke, Suwa, JP;
Kenichi Takagi, Suwa, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A mask forming method that can reduce manufacturing cost is disclosed. The method forms a mask on the surface of a member to be processed in order to form a desired pattern using liquid material for patterning. The method also includes applying resist to the entire surface of the member to be processed, drying the applied resist, patterning by removing the resist in a pattern-formation area using photolithography, and heating the resist.