The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Sep. 27, 2005
William N. Partlo, Poway, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David W. Myers, Poway, CA (US);
William Oldham, Orinda, CA (US);
William N. Partlo, Poway, CA (US);
Alexander I. Ershov, San Diego, CA (US);
Igor V. Fomenkov, San Diego, CA (US);
David W. Myers, Poway, CA (US);
William Oldham, Orinda, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An EUV light source collector erosion mitigation method and apparatus for a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma, is disclosed which may comprise including within an EUV plasma source material a replacement material. The replacement material may comprise the same material as the capping material of the multilayered mirror. The replacement material may comprise a material that is essentially transparent to light in a selected band of EUV light, e.g., a spectrum of EUV light generated in a plasma of a plasma source material. The replacement material may comprise a material not susceptible to being etched by an etching material used to remove deposited plasma source material from the collector, e.g., a halogen etchant.