The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Jun. 20, 2002
Tetsuo Endoh, Natori, JP;
Fujio Masuoka, Sendai-shi, Miyagi, JP;
Noboru Takeuchi, Fukuyama, JP;
Takuji Tanigami, Fukuyama, JP;
Takashi Yokoyama, Sendai, JP;
Tetsuo Endoh, Natori, JP;
Fujio Masuoka, Sendai-shi, Miyagi, JP;
Noboru Takeuchi, Fukuyama, JP;
Takuji Tanigami, Fukuyama, JP;
Takashi Yokoyama, Sendai, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Other;
Abstract
A method for evaluating a plane orientation dependence of a semiconductor substrate comprises: forming a hard mask on a semiconductor substrate having plane orientation (); anisotropically etching the semiconductor substrate with use of the hard mask as a mask to obtain a surface oriented in a specific crystal orientation; and evaluating a plane orientation dependence of the semiconductor substrate by use of at least a portion of the surface oriented in a specific crystal orientation.