The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 28, 2006
Filed:
Sep. 29, 2003
James J. Xie, San Jose, CA (US);
Kashmir S. Sahota, Fremont, CA (US);
Richard J. Huang, Cupertino, CA (US);
James J. Xie, San Jose, CA (US);
Kashmir S. Sahota, Fremont, CA (US);
Richard J. Huang, Cupertino, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method for Chemical-Mechanical Polishing utilizes a two step process. The first step utilizes a slurry with abrasive particles which become embedded into a conditioned polishing pad having small cavities in the surface. During the second step the slurry flow is discontinued and the final polishing is performed using the embedded small abrasive particles. Using this method dishing has been reduced considerably, and has enabled the fabrication of a Damascene metal gate NMOSFET fabricated with Atomic Layer Deposition (ALD).