The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 21, 2006
Filed:
Feb. 11, 2005
Applicants:
Du B. Nguyen, Danbury, CT (US);
Birendra N. Agarwala, Hopewell Junction, NY (US);
Conrad a Barile, Wappingers Falls, NY (US);
Jawahar P. Nayak, Wappingers Falls, NY (US);
Hazara S. Rathore, Stormville, NY (US);
Inventors:
Du B. Nguyen, Danbury, CT (US);
Birendra N. Agarwala, Hopewell Junction, NY (US);
Conrad A Barile, Wappingers Falls, NY (US);
Jawahar P. Nayak, Wappingers Falls, NY (US);
Hazara S. Rathore, Stormville, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 23/535 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides an interconnect structure that includes a diffusion barrier which is positioned within the structure in a fashion that increases the reliability and lifetime of the interconnect structure.