The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Oct. 04, 2004
Shigeo Tokumitsu, Tokyo, JP;
Shigeo Tokumitsu, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
First active regions and second active regions intersecting the first active regions at a right angle are defined on the surface of a semiconductor substrate, and diffusion regions are formed in the first and second active regions to interpose an intersecting region therebetween. Then, a gate structure is formed linearly to extend over the intersecting region at a non-zero angle with respect to the first and second active regions. Further, terminals to be connected to metal interconnects are provided on the diffusion regions at a non-zero angle with respect to the first and second active regions, respectively. Consequently provided is a nonvolatile semiconductor memory having a simple gate structure capable of storing 4-bits of information in one memory cell.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile