The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2006
Filed:
Nov. 28, 2005
Adlai H. Smith, Escondido, CA (US);
Robert O. Hunter, Jr., Snowmass Village, CO (US);
Bruce B. Mcarthur, San Diego, CA (US);
Adlai H. Smith, Escondido, CA (US);
Robert O. Hunter, Jr., Snowmass Village, CO (US);
Bruce B. McArthur, San Diego, CA (US);
Litel Instruments, San Diego, CA (US);
Abstract
A reticle stage grid and yaw in a projection imaging tool is determined by exposing a first portion of a reticle pattern onto a substrate with a recording media thereby producing a first exposure. The first portion of the reticle pattern includes at least two arrays of alignment attribute that have features complementary to each other. The reticle stage is then shifted and a second portion of the reticle pattern is exposed. The first and second exposures overlap and interlock to create completed alignment attributes. Measurements of positional offsets of the completed alignment attributes are used to determine the reticle stage grid and yaw.